LHL16NB151K Taiyo Yuden, LHL16NB151K Datasheet - Page 15
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LHL16NB151K
Manufacturer Part Number
LHL16NB151K
Description
INDUCTOR 150UH 2.4A RADIAL
Manufacturer
Taiyo Yuden
Series
LHr
Datasheet
1.LHL08TB100K.pdf
(21 pages)
Specifications of LHL16NB151K
Inductance
150µH
Current
2.4A
Tolerance
±10%
Dc Resistance (dcr)
110 mOhm Max
Q @ Freq
60 @ 796kHz
Self Resonant Freq
2.3MHz
Package / Case
Radial
Mounting Type
Through Hole
Operating Temperature
-25°C ~ 105°C
Frequency - Test
796kHz
Applications
General Purpose
Lead Free Status / RoHS Status
Lead free / RoHS Compliant
Shielding
-
Current - Saturation
-
Current - Temperature Rise
-
△
16.DC bias characteristic
17.Body strength
18.Resisitance to vibration
!
RELIABILITY DATA
当社カタログをご使用の際には 「当社製品に関するお断り」 を必ずお読みください。
Item
△L/L:Within ー10%
No abnormality as damage.
△L/L:
Within±5%
Q:30min.
FA02
Type
△L/L:
Within±5%
CAL45
Type
(LHLP:
Appearance:
No
abnomality
△L/L:
Within±5%
Q change:
Within±30%
only △L/L)
LHL□□□
Specified Value
No
abnormality
such as
cracks on
body.
Appearance:
No
abnomality
Impedance
Within±20%
change:
FBA/FBR
FL05□
Type
FL06BT
Type
△
!
Please read the "Notice for TAIYO YUDEN products" before using this catalog.
FA ・CA:
Measure inductance with appliation of rated current
using LCR meter to compare it with the initial value.
FA02:
Applied force:30N
Duration:10 sec.
Speed:Shall attain to specified force in 2 sec.
CAL45:
Applied force:50N
Duration:10 sec.
Speed:Shall attain to specified force in 2 sec.
FBA:
Applied force:50±3N
Duration:30±1 sec.
FA ・CA:
Directions:2 hrs each in X, Y and Z directions total:6hrs.
Frequency range:10 to 55 to 10Hz ( 1min.)
Amplitude:1.5mm
Mounting method:Soldering onto printed board.
Recovery : At least 1hr of recovery under the standard
LHL□□□・FB:
Directions:2 hrs each in X, Y and Z directions total:6hrs.
Frequency range:10 to 55 to 10Hz ( 1min.)
Amplitude:1.5mm (But don't exceed acceleration 196m/s
Mounting method:Soldering onto printed board.
(two power)
condition after the test, followed by the
measurement within 2hrs.
Test Method and Remarks
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