HCTS20D/SAMPLE INTERSIL [Intersil Corporation], HCTS20D/SAMPLE Datasheet

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HCTS20D/SAMPLE

Manufacturer Part Number
HCTS20D/SAMPLE
Description
Radiation Hardened Dual 4-Input NAND Gate
Manufacturer
INTERSIL [Intersil Corporation]
Datasheet
September 1995
CAUTION: These devices are sensitive to electrostatic discharge; follow proper IC Handling Procedures.
1-888-INTERSIL or 321-724-7143
Copyright © Intersil Americas Inc. 2002. All Rights Reserved
Features
• 3 Micron Radiation Hardened SOS CMOS
• Total Dose 200K RAD (Si)
• SEP Effective LET No Upsets: >100 MEV-cm
• Single Event Upset (SEU) Immunity < 2 x 10
• Dose Rate Survivability: >1 x 10
• Dose Rate Upset >10
• Latch-Up Free Under Any Conditions
• Military Temperature Range: -55
• Significant Power Reduction Compared to LSTTL ICs
• DC Operating Voltage Range: 4.5V to 5.5V
• LSTTL Input Compatibility
• Input Current Levels Ii ≤ 5µA at VOL, VOH
Description
The Intersil HCTS20MS is a Radiation Hardened Dual 4-Input
NAND Gate. A low on any input forces the output to a High state.
The HCTS20MS utilizes advanced CMOS/SOS technology to
achieve high-speed operation. This device is a member of radia-
tion hardened, high-speed, CMOS/SOS Logic Family.
The HCTS20MS is supplied in a 14 lead Ceramic flatpack
(K suffix) or a SBDIP Package (D suffix).
Ordering Information
HCTS20DMSR
HCTS20KMSR
HCTS20D/
Sample
HCTS20K/
Sample
HCTS20HMSR
(Typ)
- VIL = 0.8V Max
- VIH = VCC/2 Min
NUMBER
PART
TEMPERATURE
-55
-55
o
o
RANGE
C to +125
C to +125
+25
+25
+25
|
Intersil (and design) is a trademark of Intersil Americas Inc.
TM
10
o
o
o
C
C
C
RAD (Si)/s 20ns Pulse
o
o
C
C
Intersil Class
S Equivalent
Intersil Class
S Equivalent
Sample
Sample
Die
SCREENING
12
o
LEVEL
C to +125
RAD (Si)/s
o
-9
C
14 Lead SBDIP
14 Lead Ceramic
Flatpack
14 Lead SBDIP
14 Lead Ceramic
Flatpack
Die
2
/mg
Errors/Bit-Day
PACKAGE
420
Pinouts
Functional Diagram
NOTE: L = Logic Level Low, H = Logic level High, X = Don’t Care
14 LEAD CERAMIC METAL SEAL FLATPACK PACKAGE
HCTS20MS
GND
An
Bn
Cn
Dn
NC
A1
B1
C1
D1
Y1
An
H
L
X
X
X
14 LEAD CERAMIC DUAL-IN-LINE METAL SEAL
PACKAGE (SBDIP) MIL-STD-183S CDIP2-T14
(FLATPACK) MIL-STD-183S CDFP3-F14
Bn
H
X
X
X
GND
L
NC
INPUTS
A1
B1
C1
D1
Y1
Dual 4-Input NAND Gate
1
2
3
4
5
6
7
TRUTH TABLE
1
2
3
4
5
6
7
Cn
X
X
X
H
L
TOP VIEW
TOP VIEW
Radiation Hardened
Dn
X
X
X
H
L
Spec Number
14
13
12
11
10
9
8
14
13
12
10
11
9
8
VCC
D2
C2
NC
B2
A2
Y2
OUTPUTS
Yn
FN3051.1
H
H
H
H
L
518619
VCC
D2
C2
NC
B2
A2
Y2
Yn

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HCTS20D/SAMPLE Summary of contents

Page 1

TM September 1995 Features • 3 Micron Radiation Hardened SOS CMOS • Total Dose 200K RAD (Si) • SEP Effective LET No Upsets: >100 MEV-cm • Single Event Upset (SEU) Immunity < (Typ) • Dose Rate Survivability: ...

Page 2

Absolute Maximum Ratings Supply Voltage (VCC -0.5V to +7.0V Input Voltage Range, All Inputs . . ...

Page 3

TABLE 2. AC ELECTRICAL PERFORMANCE CHARACTERISTICS PARAMETER SYMBOL Input to Output TPHL VCC = 4.5V TPLH VCC = 4.5V NOTES: 1. All voltages referenced to device GND measurements assume RL = 500Ω 50pF, Input TR = ...

Page 4

TABLE 5. BURN-IN AND OPERATING LIFE TEST, DELTA PARAMETERS (+25 PARAMETER ICC IOL/IOH CONFORMANCE GROUPS Initial Test (Preburn-In) Interim Test I (Postburn-In) Interim Test II (Postburn-In) PDA Interim Test III (Postburn-In) PDA Final Test Group A (Note 1) Group B ...

Page 5

TABLE 8. STATIC AND DYNAMIC BURN-IN TEST CONNECTIONS OPEN GROUND STATIC BURN-IN I TEST CONNECTIONS (Note 10, 12, 13 STATIC BURN-IN II TEST CONNECTIONS (Note ...

Page 6

Intersil Space Level Product Flow - ‘MS’ Wafer Lot Acceptance (All Lots) Method 5007 (Includes SEM) GAMMA Radiation Verification (Each Wafer) Method 1019, 4 Samples/Wafer, 0 Rejects 100% Nondestructive Bond Pull, Method 2023 Sample - Wire Bond Pull Monitor, Method ...

Page 7

AC Timing Diagrams VIH INPUT VS VIL TPLH VOH VS OUTPUT VOL TTLH VOH 80% 20% OUTPUT VOL AC VOLTAGE LEVELS PARAMETER HCTS VCC 4.50 VIH 3.00 VS 1.30 VIL 0 GND 0 All Intersil U.S. products are manufactured, assembled ...

Page 8

Die Characteristics DIE DIMENSIONS: 2.20 x 2.24(mm) METALLIZATION: Type: SiAl ± 1k Å Å Metal Thickness: 11k GLASSIVATION: Type: SiO 2 ± 2.6k Å Å Thickness: 13k WORST CASE CURRENT DENSITY <2 A/cm BOND PAD SIZE: ...

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